








Vol
ume 
Cha
pter 
Section 
Page 
Beginning
Line 
Correction
Required 


3 
6 
6.2.1.1 
11 
3rd para. 
To correct <gamma_{i }> with <gamma_{i,p}_{ }> and <gamma_{k} > with <gamma_{k,i,p} >
(here and everywhere) 


3 
6 
6.2.1.1 
24 
1st para. 
In first paragraph under "Calculation of ai and aki using
the default weighting factors gammai,p and gammak,i,p," insert "formed from gas i"
between "fractions of gas i and byproducts k" and "(based on
mass)". 


3 
6 
6.2.1.1 
24 
2nd para. 
In second paragraph under "Calculation of ai and aki using
the default weighting factors gammai,p and gammak,i,p," insert "using the Tier 2a method (or the Tier 2b or Tier 3b
method)" between "inventory
compilers" and "should use Equations 6.10 and 6.11". 


3 
6 
6.2.1.1 
24 
2nd para. 
Insert the following paragraph after the second paragraph under
"Calculation of ai and aki using the default weighting factors gammai,p
and gammak,i,p,": "In all of these
equations (6.10, 6.11, 6.18, and 6.19),
the fraction of precontrol emissions that is exhausted to emissions
control systems is approximated using the fraction of the total number of
tools that exhaust to emissions control systems.[insert new footnote provided below that begins "If a
facility"] This approximation
is expected to be reasonably good by itself if all the tools are running the
same process type (e.g., chamber cleaning vs. etching). However, the
approximation may be poor by itself if the tools are running different
process types, because emissions per tool can vary greatly across different
process types. In Equations 6.10 and 6.11, the fraction of emissions
destroyed is estimated across different process types. Thus, in these
equations, new default weighting factors (γ_{i,p} for input gases and γ_{k,i,p} for byproduct gases, provided in Table 6.8) are applied
to tools that run chamber cleaning processes to increase the accuracy of the
estimate."
To avoid redundancy, delete the phrase "based on the default weighting factors (gammai and
gammak) provided in Table 6.8" from
the end of the previous paragraph. 


3 
6 
6.2.1.1 
24 
3rd para. 
Correct first and following sentences as follows: "As discussed
in Box 6.3, the gamma factors reflect the ratio of the uncontrolled emissions
per tool of gas i or byproduct k from tools running the weighted process type “p” chamber cleaning processes (in situ plasma (IPC)
and/or insitu thermal (ITC)) to the
uncontrolled emissions per tool of gas i or byproduct k from tools running the reference process type “q.” etch and/or wafer cleaning (EWC) processes. When Equation
6.10 or 6.11 is used for the Tier 2a or Tier 2b method, p includes the
insitu plasma cleaning (IPC) and the insitu thermal cleaning (ITC) process
types, while q consists of the etching and wafer cleaning (EWC) process type.
(These terms include additional process types for Tier 3b; see the
definitions of the terms “p” and “q” in Equations 6.10 and 6.11.[insert new footnote provided below that begins "For
the Tier 3b method"]) For Tiers 2a and
2b, taking gamma values into account is
necessary" 


3 
6 
6.2.1.1 
24 
3rd para. 
Correct last sentence as follows: "To calculate ai and
ak,i, inventory compilers should use Equations 6.10 and 6.11 and
the default gamma factors, as well as the total numbers of tools in the
reporting facility using gas i or producing byproduct k from gas i while running process type p or q (n_{i}_{,p}, m_{i}_{,q}, n_{k}_{,i,p}, m_{k}_{,i,q}), and the numbers of those tools equipped with suitable emissions control technology for
gas i or byproduct k while running process
type p or q (n_{i,}_{p,a}, m_{i}_{,q,a}, n_{k,}_{i,p,a}, m_{k}_{,i,q,a})" 


3 
6 
6.2.1.1 
24 
4th para. 
Correct
the paragraph as follows: "For each gas
where a value for gammai,p or gammak,i,p exists, Table 6.8 provides gamma
values relating pertool emissions from the
weighted process type p IPC processes
(and, in some cases, pertool emissions from ITC processes as well) to pertool emissions from EWCthe reference
process type q processes. The gamma value column
selected by a facility depends on the gas(es) emitted by the facility and the
chamber cleaning process(es) used by the facility. The gamma value row depends on the Tier 2 method used (a or b) by the facility (Tier 2a, 2b, or 3b), whether
the gas is emitted as an input gas or byproduct, and (for Tier 2b and 3b), the wafer size.
For example, a facility emitting CF4 from both IPC processes and ITC
processes ,
or both would
use a gamma value from the second column from the left in Table 6.8. If the
facility were using the Tier 2a method to estimate emissions of CF4 as an
input gas, it would use the gammai,p value in the row immediately below the
“Tier 2a” title row in the table. The corresponding equipment tool counts ni,p would be the total
numbers of pieces
of equipment tools that emit CF4 as an input gas and that run either IPC andor ITC processes, respectively, and the
corresponding equipment tool counts n_{i,p,a} would be the total
numbers of pieces
of equipment tools that emit CF4 as an
input gas, that run either IPC andor ITC processes,
respectively, and that are abated . (If the facility emits CF4 as an input gas from both
IPC and ITC processes, ni and nai are the sum of the applicable equipment
counts across the two process types.) 


3 
6 
6.2.1.1 
24 
footnote 
Delete the current footnote 6 that reads, "As tools running etch and/or wafer cleaning process
often use multiple input gases that may each produce CF4 or C2F6 as a
byproduct, inventory compilers should be careful not to double count when
totalling the number of etch tools that produce byproduct k (mk) and the
total number etch tools that produce byproductk that are abated (mak).
Values for mak and mk should not exceed the total number of tools that run
etch and/or wafer cleaning processes in the fab." 


3 
6 
6.2.1.1 
24 
new footnote 
Insert a new footnote that reads, "If
a facility monitors input gas consumption by tool (e.g., using MFCs), this
information rather than tool counts may be used to calculate ai,p and ak,i,p.
Similarly, if a facility using the 3b method monitors or otherwise apportions
gas consumption by process type, Equations 6.18 and 6.19 may be used to
estimate ai,p and ak,i,p for all process types at the facility." 


3 
6 
6.2.1.1 
24 
new footnote 
Insert a new footnote that reads, "For
the Tier 3b method (stack testing), gamma values are also provided for remote
plasma clean (RPC) for FCs and for thinfilm deposition (TFD) for N2O. The
Tier 2a and 2b methods require apportioning between TFD and “Other” N2O
processes and between RPC and other FC processes and therefore do not need
gamma values for TFD and RPC." 


3 
6 
6.2.1.1 
25 
Box 6.3 
Correct the first sentence to "To estimate the fraction of
an FC abated when that FC is exhausted emitted from both chamber cleaning processes and EWC processes,
the Tier 2a, Tier 2b, and Tier 3b methods apply default weighting factors (γ_{i,p} and γ_{k,i,p}) to the numbers of abated
and unabated tools running chamber cleaning processes (see Equations 6.10 and
6.11). 


3 
6 
6.2.1.1 
25 
Box 6.3 
After the first sentence, add the parenthetical statement: (As discussed above, the Tier 3b method also applies
default weighting factors to the numbers of abated and unabated tools running
N2Ousing TFD processes.) 


3 
6 
6.2.1.1 
25 
Box 6.3 
In the current second sentence, correct "the Tier 2a and 2b
methods" to "the Tier 2a, Tier 2b, and Tier 3b methods" 


3 
6 
6.2.1.1 
25 
Box 6.3 
Correct sentence beginning "These differences are reflected
in the default gamma values," to "These differences are reflected
in the default gamma values, which range from 1.4 to
26 for FC input gases, for example." 


3 
6 
6.2.1.1 
26 
Equation 6.10 
To correct Equation 6.10 as follows.
In the title of the equation, replace "emitted" with
"exhausted."
The original:
The resulting:
To correct definitions under Equation 6.10 as follows:
ai = estimate of the fraction of gas i exhausted from process tools
equipped with suitable emissions control technologies, sitespecific
fraction
ni,p,a = number of tools that use gas i, that run process type p, and that
are equipped with suitable emissions control technologies for gas i,
sitespecific
mi,q,a = number of tools that use gas i, that run process type q, and that
are equipped with suitable emissions control technologies for gas i,
sitespecific
ni,p = total number of tools using gas i and running process type p,
sitespecific
mi,q = total number of tools using
gas i and running process type q, sitespecific
[gamma]i,p = default factor reflecting the ratio of uncontrolled emissions
per tool of input gas i from tools running process type p to uncontrolled
emissions per tool of input gas i from process tools running process type q,
fraction
i = input gas
p = weighted process type. When Equation 6.10 is being used for the Tier 2a
or Tier 2b method, p includes IPC and/or ITC. When Equation 6.10 is being
used for the Tier 3b method and gas i is an FC, p includes RPC, IPC, and/or
ITC. When Equation 6.10 is being used for the Tier 3b method and gas i is
N2O, p consists of thinfilm deposition.
q = reference process type. When gas i is an FC, q consists of the
combination of etching and/or wafercleaning processes. When gas i is N2O, q
consists of the “Other” process type. 


3 
6 
6.2.1.1 
26 
Equation 6.11 
To correct Equation 6.11 as follows.
In the title of the equation, replace "emitted" with
"exhausted."
The original:
The resulting:
To correct definitions under Equation 6.11 as follows:
ak,i = estimate of the fraction of byproduct k formed from input gas i that
is exhausted from process tools that are equipped with suitable emissions
control technologies, sitespecific fraction
nk,i,p,a = number of tools that exhaust byproduct k formed from input gas
i, that run process type p, and that are equipped with suitable emissions
control technology for byproduct k, sitespecific
mk,i,q,a = number of tools that exhaust byproduct k formed from input gas
i, that run process type q, and that are equipped with suitable emissions
control technology for byproduct k, sitespecific
nk,i,p = total number of tools exhausting byproduct k formed from input
gas i and running process type p, sitespecific
mk,i,q = total number of tools exhausting byproduct k formed from input
gas i and running process type q, sitespecific
[gamma]k,i,p = default factor reflecting the ratio of uncontrolled
emissions per tool of byproduct k from process tools using gas i and running
process type p to uncontrolled emissions per tool of byproduct k from
process tools using gas i and running process type q, fraction
i = input gas
k = byproduct gas
p = weighted process type. When Equation 6.11 is being used for the Tier 2a
or Tier 2b method, p includes IPC and/or ITC. When Equation 6.11 is being
used for the Tier 3b method and gas i is an FC, p includes RPC, IPC, and/or
ITC. When Equation 6.11 is being used for the Tier 3b method and gas i is
N2O, p consists of thinfilm deposition.
q = reference process type. When gas i is an FC, q consists of the
combination of etching and/or wafercleaning processes. When gas i is N2O, q
consists of the “Other” process type. 


3 
6 
6.2.2.1 
48 
Table 6.8 
Correct Table 6.8 as presented in the Tab <Corrigenda_Table
6.8> 


3 
6 
6.3.2 
68 
Table 6.22 
Correct Table 6.22 as presented in the Tab <Corrigenda_Table
6.22> 


3 
6 
6.2.1.1 
11 
3rd para. 
To correct <a_{k} > with <a_{k,i }> and
<a_{k,p} > with <a_{k,i,p} >
(here and everywhere) 


3 
6 
6.2.1.1 
11 
4th para. 
Correct Dk to with Dki 


3 
6 
6.2.1.1 
29 
Equation 6.14 
Correct Equation 6.14 by adding subscript "i" after
subscript "k" in variable "Dk,p"
In addition correct definitions of Equation 6.14:
1) In the definition of the term Bk,i,p, insert "use of" before
"input gas i" and replace "for" with "in"
before "process type p," resulting in the following revised
definition: "Emission factor for byproduct k generated from use of
input gas i in process type p, kg of byproduct k created per kg of gas i consumed for process type p."
2) In addition to inserting subscript "i" in the term "Dk,p,
resulting in "Dk,i,p," correct definition of "Dk,i,p" to
"Overall reduction of mass of gas k byproduct emissions from use of
input gas i in for process type p, sitespecific fraction calculated per
Equation 6.17" 


3 
6 
6.2.1.1 
21, 23 
Equations 6.5, 6.6 and 6.8 
In definition of the term "i," add "or, for NF3, C3F8, and N2O, input gas and process type
combination" after "Input
gas." 


3 
6 
6.2.1.1 
21 
Equation 6.6 
Correct Dk term in equation to Dk,i. Correct definition of term Dk with
definition of term Dk,i
= Overall reduction of mass of emissions of byproduct gas k formed from input gas i byproduct emissions,
sitespecific fraction, calculated per
Equation 6.9. 


3 
6 
6.2.1.1 
23 
Equation 6.8 
In the text above Equation 6.8 and EVERYWHERE, correct D_{k,p} to D_{k}_{,i, }and
correct ak,p to ak,i. In the text above Equation 6.8 and EVERYWHERE, replace
"byproduct k emitted from process tools equipped with suitable
emissions control technologies" with "byproduct k emitted exhausted from process
tools equipped with suitable emissions control technologies 


3 
6 
6.2.1.1 
23 
Equation 6.9 
To correct Equation 6.9 by adding
<i> subscript to <Dk> and <ak>:
To correct definitions under Equation 6.9 as follows.
Dk,i = overall reduction of mass of emissions of byproduct k formed
from input gas i, sitespecific fraction
ak,i = estimate of the fraction of byproduct k that is formed from
input gas i and that is exhausted from process tools equipped with suitable
emissions control technologies, sitespecific fraction, as determined in
Equation 6.11 or Equation 6.19, as applicable
dk = Destruction Removal Efficiency (DRE) for byproduct k,
fraction
UT = average uptime factor of all emissions control systems,
sitespecific fraction, calculated per Equation 6.12
i = input gas, or, for NF3, C3F8, and N2O, input gas and process type
combination
k = byproduct gas 



3 
6 
6.2.1.1 
26 
Equation 6.16 
Change "emitted from" to "exhausted from" in t the definition of ai,p 


3 
6 
6.2.1.1 
30 
Equation 6.17 
In Equation 6.17, insert the subscript "i" between
"k" and "p" in the variables "Dk,p" and
"ak,p."
In the definition of Dk,i,p, insert "use of
input gas i in" between "emitted
from" and "process type p."
Correct the definition of ak,i,p to the following: "Estimate of the
fraction of byproduct k emitted exhausted from process
tools running using input gas i in
process type p and equipped with suitable emissions control technologies,
sitespecific fraction calculated per Equation 6.19"



3 
6 
6.2.1.1 
31 
Equation 6.18 
In the definition of ai,p and EVERYWHERE, change "fraction
of gas i emitted from process tools . . . equipped with suitable emissions
control technologies" to "fraction of gas i exhausted from process tools. . . equipped with suitable emissions
control technologies." Above equation
6.18, correct ai,p,a to n i,p,a. 


3 
6 
6.2.1.1 
31 
1013 
In the text above Equation 6.19, correct the first sentence to:
"To estimate the sitespecific ak,i,p value, inventory compilers may use Equation 6.19 to
calculate the ratio of the number of tools that running process type p, emitting byproduct k from use of
input gas i, and) that are equipped with suitable emissions control
technologies (na_{k},_{i,p,a}) to the
total number of tools that running process type p
and emitting byproducts k from use of
input gas i (n_{k,i,p}) using Equation 6.19. 


3 
6 
6.2.1.1 
31 
1015 
In the text above Equation 6.19, delete the remainder of the paragraph after the first sentence,
beginning with the sentence that begins "Note that byproduct k" 


3 
6 
6.2.1.1 
31 
2nd para. 
In text surrounding Equation 6.19, correct the variable name
from "m" to "n" 


3 
6 
6.2.1.1 
31 
Equation 6.19 
To correct Equation 6.19 as
follows.
To correct the title of equation 6.19 by replacing "emitted"
with "exhausted" and by adding "use of input gas i in"
between "emitted from" and "process p".
The original:
The resulting:
To correct definitions under Equation 6.19 as follows:
ak,i,p = estimate of the fraction of byproduct k exhausted from
process tools running process type p and equipped with suitable emissions
control technologies, sitespecific fraction
nk,i,p,a = number of process tools that run process type p, emit
byproduct k from use of input gas i, and are equipped with suitable
emissions control technologies, sitespecific
nk,i,p = total number of process tools running process type p and
emitting byproduct k from use of input gas i, sitespecific
i = input gas
k = byproduct gas
p = process type 



3 
6 
6.2.1.1 
40 
Equation 6.26 
To correct Equation 6.26 as follows.
The original:
The resulting:
To correct definitions under Equation 6.26 as follows:
EAk,f = annual emissions of FC byproduct k from the stack systems that
are tested for facility f, kg/year
EFk,f = emission factor for FC byproduct gas k, emitted from facility f
representing 100 percent emissions control system uptime, as calculated in
Equation 6.24 of this section, kg emitted/kg of all FC input gases
consumed
Ci,f = total consumption of FC input gas i for facility f for the
reporting year, kg
UTf = the total uptime of all emissions control systems for facility f,
during the reporting year as calculated using Equation 6.27 of this section,
fraction
ak,i,f = estimate of the fraction of FC byproduct gas k formed from input
gas i that is exhausted from process tools equipped with suitable emissions
control technologies, sitespecific fraction as determined in Equation 6.11
for facility f
dk = Destruction Removal Efficiency (DRE) for FC byproduct gas k,
fraction
i = FC input gas
k = FC byproduct gas 


3 
6 
6.2.1.1 
36 
5th para. 
In the paragraph immediately under the heading "Testing
Frequency," replace "In addition" with "On the other
hand". 


3 
6 
6.2.1.1 
36 
5th para. 
Correct the first sentence of the second bullet under the 5th
paragraph to read, "Annual consumption of an FC that was not used during
the emissions test andor that is not
included in the facilityspecific emission factors rises to 5% (expressed
in CO2e) of the annual FC consumption of the fab. " 


3 
6 
6.2.1.1 
36 
5th para. 
Add the following parenthetical statement to the second bullet:
"(For FCs that were not used during the
emissions test and whose consumption falls below 5% of annual fab
consumption, Tier 2 or 3a methods should be used to estimate emissions to
ensure completeness.)" 


3 
6 
6.2.1.1 
36 
Last line 
Correct "substrate size manufactured" to
"substrate size used" 


3 
6 
6.2.1.2 
37 
1st para. 
Correct third bullet under the first paragraph to read
"Emissions testing should be conducted during a period of 8 hours or
longer per stack system while the facility is operating at a representative
level with representative emissions control system uptime. (Representative uptime is particularly important for
emission control systems that have not been certified not to form CF4 from F2
exhausted by the process.) Representative in
this case means that normal process tools’ or emissions control systems’
maintenance is being performed during the stack emissions test and that
processes running during the test are indicative of normal facility
operations. 


3 
6 
6.2.1.1 
37 
1st para. 
Correct the first sentence in the fourth bullet under first
paragraph to read "Measurements
should be taken for N2O and all FC gases known to be used by the facility and any
possible FC gas byproducts. " 


3 
6 
6.2.1.1 
37 
1st para. 
Correct the last bullet under the first paragraph as follows:
"If consumption of an FC gas is too low to be
accurately measured during the testing period, then in order to account for
usage, either
the testing period should be increased or
consumption from
prorated longterm consumption data may should be calculated for
the testing period by prorating longterm consumption data." 


3 
6 
6.2.1.1 
38 
3rd para. 
In the last paragraph on the page, after "as
applicable", delete the remainder of the sentence, insert a period and add the following
sentences: "For FC gases, use Equations
6.23a and 6.23b or 6.23a and 6.23c of this section. For N2O, always use Equation 6.23b, even if
this results in an emission factor greater than 1."
Then insert
a paragraph break and correct the remaining sentences (now a new paragraph) to
read: "Equation 6.23a calculates ESimax,f, the controlled
emissions that would result during the sampling period if the utilization
rate for the FC input gas i were equal to 0.2 (the minimum discussed above in
“Adapting Tier 2 Methods to Account for Technological Changes”). If ∑_{s}ES_{i,s} (the total
measured emissions of the FC across all stack systems) falls below ESimax,f,
then use Equation 6.23b to calculate EFi,f (the abated 1U factor for the FC
input gas i). If ∑_{s}ES_{i,s} equals or exceeds ESimax,f, use Equation 6.23c to
calculate EFi,f, and treat the
difference between ∑sESi,s and ESimax,f as a byproduct of the other input
gases, using Equation 6.24 of this section." 


3 
6 
6.2.1.1 
39 
1st para. 
Correct second sentence in paragraph to read "When
calculating the byproduct emission factor for an FC input gas i for which ∑sESi,s
equals or exceeds ESimax,f,emissions exceeded its consumption, inventory compilers should exclude the consumption of
that input gas from the term ∑ Activityi,f. 


3 
6 
6.2.1.1 
39 
Equation 6.23 
Above the current Equation 6.23, insert a new Eqation 6.23a (see
tab titled "Added Equations 6.23a + 6.23c"). 


3 
6 
6.2.1.1 
39 
Equation 6.23 
Redesignate current Equation 6.23 as Equation 6.23b 


3 
6 
6.2.1.1 
39 
Equation 6.23 
In the definition of UTf, correct equation reference from
"6.30" to "6.27" 


3 
6 
6.2.1.1 
39 
Equation 6.23 
After the newly designated Equation 6.23b, insert a new Equation
6.23c. (See tab titled "Added Equations 6.23a + 6.23c") 


3 
6 
6.2.2.1 
58 
Table 6.17 
1) The C2F4 DRE default of 0.96 should be corrected to 0.98; 2)
The C2F6 DRE default of 0.95 should be corrected to 0.98; 3) The CH2F2 DRE
default of 0.98 should be corrected to 0.99; 4) The CH3F DRE default of 0.98
should be corrected to 0.99; 5) The C2HF5 DRE default of 0.95 should be
corrected to 0.98; 6) The SF6 DRE default of 0.95 should be corrected to
0.96. 


3 
6 
6.2.2.1 
47 
Table 6.7 
In Table 6.7, correct the input gas and selected byproduct
emission factor values for the input gases CF4, CHF3, C4F8, C4F6, CH3F, NF3
. 


3 
6 
6.2.2.1 
47 
Tables 6.7, 6.9, 6.10, 6.11, and 6.12 
Clarify references to tables 6.7, 6.9, 6.10, 6.11, 6.12. Add
phrase after "Data collected under the U.S. EPA Greenhouse Gas Reporting
Rule (GHGRP, 40 U.S. Code of Federal Regulations (CFR) part 98; Subpart
I)". Phrase to add: "Subsets of the data available at
https://www.regulations.gov/docket?D=EPAHQOAR20110028" 


3 
6 
6.2.2.1 
49 
Table 6.9 
In Table 6.9, for the 200mm wafer size, correct the input gas
and selected byproduct emission factor values for the input gases CF4 and
C4F6 for etching and wafer cleaning processes. In addition, correct the
byproduct emission factor value for C5F8 formed from cC4F8 and for C2F6
formed from SF6. For the 300mm wafer size, correct the input gas and
selected byproduct emission factor values for the input gases CHF3 and C4F8
for etching and wafer cleaning processes. 


3 
6 
6.2.2.1 
50 
Table 6.10 
In Table 6.10, correct the input gas and selected byproduct
emission factor values for the input gases CF4 and C4F6 for etching and wafer
cleaning processes. 


3 
6 
6.2.2.1 
51 
Table 6.11 
In Table 6.11, correct the input gas and selected byproduct
emission factor values for the input gases CHF3 and C4F8 for etching and
wafer cleaning processes. One value for CH3F was corrected due to
transcription error. 


3 
6 

3 
Table of Contents, Table of Equations, Table of Figures, and
Table of Tables 
Correct Table of Contents, Table of Equations, Table of Figures,
and Table of Tables to reflect all corrections 


3 
6 
6.1.1 
7 
Second and third full paragraphs 
Add subheading for section 6.1.1.1 "Compounds used and
emitted" above second full paragraph. Add subheading for section 6.1.1.2
"Processes leading to emissions" above third full paragraph. In
third full paragraph, after the third sentence, insert the sentence "In
this chapter, input gases are generally designated with the subscript
"i."" Also in the third full paragraph, after the sixth full
sentence, insert the sentence, "In this chapter, byproduct gases are
generally designated with the subscript “k” (or “k,i” where a particular
input gas “i” reacts to form the byproduct “k”)." 


3 
6 
6.1.1 
8 
First line on page 
Remove parenthetical "(TFD)" after "thin film
deposition " 


3 
6 
6.1.2 
9 
2nd para. 
In the second and third paragraphs, replace "by process
types" with
"by process type." (Three occurrences.) 


3 
6 
6.1.2 
9 
Table 6.2 
In the heading for the second set of columns from the left,
capitalize "Compounds" 


3 
6 
6.1.2 
9 
Table 6.2 
In the first footnote to Table 6.2, to
correct <updates the default emission
factors for the 2006 Guidelines Tier 2b method> to <now includes a
default factor for N2O TFD>. The full footnote will now read, <For
display, the Tier 2c method now includes a default factor for N2O TFD but is
otherwise similar to the former 2b method. The Tier 2c method does not
distinguish by substrate size for display.> 


3 
6 
6.2.1.2 
11 
3th para. 
Insert a footnote after "exhausted": <In this chapter, the fraction of gas or quantity of gas
“exhausted” from process tools refers to the fraction or quantity of that gas
that emerges from the tools before abatement is accounted for (i.e., the
precontrol emissions). For example, if half of the tools that run etch
processes with CHF3 are equipped with suitable emissions control
technologies, then the fraction of CHF3 exhausted from etch process tools
that are equipped with suitable emissions control technologies is 50
percent.> 


3 
6 
6.2.1.1 
11 
4th para. 
To remove the following text <and
to the sets of tools within each process type that are either abated or
unabated> after <Apportioning is
required to track gas consumption to process types>. 


3 
6 
6.2.1.1 
11 
4th para. 
The word <precontrol> is missing. To insert
<precontrol> before <emissions of each gas from each process
type.> to read < and (2) in the case of emissions control calculations,
the pertool precontrol emissions of each gas from each process type> 


3 
6 
6.2.1.1 
14 
Table 6.3 
Correct Table 6.3 to reflect other changes in the chapter
(detailed above). See tab for table 6.3 in this workbook. 


3 
6 
6.2.1.1 
18 
Equation 6.1 
In Equation 6.1, (1) add "for
semiconductors and MEMS, g for display and PV"
to the end of the definition of {Ei}n, and (2) delete "either" and
add "MEMS" to the definition of delta. The resulting definitions
will read "{Ei}n = emissions of fluorinated compound gas i (FCi) or N2O,
kg for semiconductors and MEMS, g for display
and PV" and "[delta] = 1 when
Equation 6.1 is applied to PV industry and zero when Equation 6.1 is applied
to either semiconductor, MEMS, or TFTDisplay industries, dimensionless 


3 
6 
6.2.1.1 
18 
Equation 6.1 
In Equation 6.1, in the note under the definition of {Ei}n,
replace "#" placeholders with actual numbers applicable to each
product type. Corrected text will read: "the number of gases included in
each set ({12} for
semiconductors, {6} for display, {3} for MEMS, and {2} for PV, see Table 6.6)." 


3 
6 
6.2.1.1 
22 
3rd para. 
Replace "l" with "c" for consistency with
Equation 6.3 


3 
6 
6.2.1.1 
26 
Equation 6.12 
In the definitions of Td and TT, remove parentheses around
"minutes per year" and correct spacing around preceding
commas. In the definition of
"N," make the "n" lower case. 


3 
6 
6.2.1.1 
28 
2nd para. 
Remove the "in" before "included" 


3 
6 
6.2.1.1 
28 
2nd para. 
Correct the list of variable names to the following:
"(Ci,p, Di,p, Dk,i,p, ai,p, ak,i,p, ni,p,a, ni,p, nk,i,p,a, nk,i,p, UTp,
Tdn,p, TTn,p)" 


3 
6 
6.2.1.2 
29 
3rd para. 
After the first three sentences in this paragraph, delete the
remaining text, starting with the phrase, "Because sitespecific factors
should be accounted for. . ." 


3 
6 
6.2.1.1 
29 
Equation 6.15 
In the title of Equation 6.15, insert
"hydrocarbonfuelled" before "combustion emissions control
equipment." 


3 
6 
6.2.1.1 
33 
2nd para. 
Correct "allowing protection of the underlying confidential
nature of the information" to "allowing protection of any
underlying confidential information. " 


3 
6 
6.2.1.1 
39 
Equation 6.24 
In Equation 6.24 and the definition of the term a_{k,f}, insert an
"i" subscript in that term, resulting in the term a_{k,i,f}. 


3 
6 
6.2.1.1 
39 
Equation 6.24 
In the definition of the term ak,i,f, insert "k formed from
input gas i that is exhausted" between "fraction of
byproduct" and "from process tools equipped". 


3 
6 
6.2.1.1 
39 
Equation 6.24 
In the definition of the term UTf, correct the reference from
"Equation 6.30" to "Equation 6.27" 


3 
6 
6.2.1.1 
40 
Equation 6.25 
In the definition of the variable EF_{i,f}, replace "as calculated in Equation 6.26" with
"as calculated in Equation 6.23B or 6.23C, as appropriate." 


3 
6 
6.2.1.1 
40 
Between Equation 6.25 and 6.26 
Immediately above Equation 6.26, correct "After calculating
E_{i,f}"
to "After calculating EA_{i},_{f}" 


3 
6 
6.2.1.1 
41 
Equation 6.27 
In the definition of UTf, replace the variables "Td_{pf}," and "UT_{pf}" with "Td_{n,f,}" "TT_{n,f},"and "UT_{n,f}" 


3 
6 
6.2.1.1 
41 
Equation 6.27 
In the definition of TTnf, replace "Equations 6.25 and
6.26" with "Equations 6.23 and 6.24" 


3 
6 
6.2.1.1 
46 
Table 6.6 
In the second footnote, correct the references to "Table
6.6" and "Table 6.5" to "Table 6.7" 


3 
6 
6.2.2.1 
47 
Tables 6.7, 6.9, 6.10, 6.11,
6.12, and 6.13. 
Add "(fraction)" after "Default Emission
Factors" in the title of each table. 


3 
6 
6.2.2.1 
55 
2nd para. 
Replace "Unless the original equipment manufacturer (OEM)
or the electronic devices manufacturer can certify that the rate of
conversion from F2 to CF4 or from NF3 to CF4 is <0.1 percent on a mass
basis" with "Unless the emissions control system manufacturer
(referred to below as the “original equipment manufacturer” or “OEM”) can
certify that the rate of conversion from F2 to CF4 is <0.1 percent on a
mass basis" 


3 
6 
6.2.2.1 
55 
4th para. 
Correct "verify emissions control technologies" to
"verify that emissions
control systems" 


3 
6 

55 

Add footnote referencing Dr. Li paper after current footnotes 8
and 9: "Li, ShouNan, JungNan Hsu, HuiYa
Shih, ShuJen Lin and JenLiang Hong (2002). "FTIR spectrometers measure
scrubber abatement efficiencies." Solid State Technology, 45: 157165. " 


3 
6 
6.2.3 
59 
1st para. 
Move footnote defining "fab" from this paragraph to
the first occurrence of the word "fab" on page 12 in section
6.2.1.1. 


3 
6 
6.3.1 
61 
3rd para. 
Delete the following sentence: "However, for the Tier 2c
method and for some gases, process types, and wafer size combinations, the
relatively large number of experimental emission factors taken into account
for some combinations (e.g. when more than 2030 individual experimental
factors are averaged to estimate a particular default Tier 2c factor)
provides higher confidence that the default can accurately represent actual
(facilityspecific) emission factors." 


3 
6 
6.3.1 
61 
5th para. 
Replace "substratetosubstrate variability" with
"wafertowafer variability" 


3 
6 
6.3.2 
67 
3rd para. 
Correct sentence as follows: "Another major source of
uncertainty and potential errors in activity data is related to gas
consumption apportioning, where consumption may need to be distinguished
apportioned by wafer size (Tier 2b), apportioned
toby specific process type (Tier 2c), and, to a limited extent, Tiers 2a and 2b), and/or by specific recipes or families of similar recipes (Tier 3a), or specific stacks (Tier 3b)". 


3 
6 
6.3.2 
67 
5th para. 
Insert "i" subscripts in the ak, Dk, and gamma factors
in this paragraph. Also insert "p" subscripts in the gamma factors. 


3 
6 
6.3.2 
67 
6th para. 
Remove "However" at the beginning of the sentence. 


3 
6 
6.4.1 
68 
3rd para. 
Change "biases can exist" to "biases may
exist". 


3 
6 
6.3.2 
68 
Table 6.23, column headers 
Correct Table 6.23 as follows.
 In the column headers: Insert "(Gaseous and Liquid FCs)" after
"Tier 1" in the second column from the left. Correct
"(Fluorinated Liquids)" to "(Liquid FCs)" after
"Tier 2" in the third column from the left.
 In the 1st row: Insert a new row directly under the column header row
listing "Emissions by FC and electronics subsector" in the
"Data" column and including an "X" under Tier 1
 In the 3rd row: Insert a new row directly above the row whose entry
begins "Inventories of input gases and heat transfer fluids." In
the first column ("Data") of the new row, include the following
entry: "For gaseous FCs, emissions by FC, electronics subsector, process
type, wafer size (if relevant), and input gas vs. byproduct. For liquid FCs,
emissions by FC and electronics subsector. " Include X's under every
column other than "Tier 1."
 In the 8th row on page 69: Correct "Apportioning factors and
consumption data for all input gases as a function of wafer size, process
types, or stacks as appropriate" to "Consumption data for all input
gases (and, except for the Tier 3b method, apportioning factors) as a
function of process type and/or wafer size as appropriate."
 In the 4th, 7th, and 8th rows on page 70: Correct all occurrences of
"by process types or stacks" with "by process type or facility."
Insert "as appropriate" at the end of the entry in the fourth
row.
 For consitency wuith text in the
section, correct "byproducts used in processes" to
"byproducts exhausted from tools 


3 
6 
6.1.2 
6.8 
last para. 
Correct with a comma as follows: "The 2006 Tier 3 method,
which was based on processspecific parameters, has evolved into a new 2019 Tier 3a method…" 


3 
6 
6.2.1.1 
6.13 
last para. 
last paragraph correct "lists" to "list" 


3 
6 
Table 6.4 
6.17 
Table 6.4 
In the header, for consitency with table 6.3 add:
"(calculated but no equation specified in this chapter)" to
"modelled" and "using an equation in this chapter" to
"claculated" 


3 
6 
two
occurrences
in text 
6.20
and
6.68 
1st and 4th para. 
Correct by adding "stack system" after "process
type" 


3 
6 
three
occurrences
in text 
6.28,
6.33,
6.42 
1st,1st,last para. 
Correct "flown" with "flowed" 


3 
6 
Equation
6.15 
6.30 
Equation 6.15 
For consistency with Equation 6.7 correct in the title
"equipment" to "systems" 


3 
6 
6.2.1.1 
6.31 
1st para. 
For consistency, correct "emitted" to
"exhausted" in the text before Equation 6.16 (New) 


3 
6 
6.2.1.2 
6.46 
2nd para. 
Correct "subsector (semiconductor, display, MEMS,
PV)" "subsectors (semiconductor, display, MEMS, PV)" 


3 
6 
6.2.1.2 
6.62 
2nd para. 
Correct "6.2.2.1" to "6.2.1.1" in the para
on "ByProduct Generation" 
















